Epson Digital Couture Fashion Week in New York-2016

Eleven selected designers from the Americas showcased their collections created using Epson’s state-of-the-art direct-to-garment and digital dye-sublimation printing. To commemorate the return of this showcase of designers coming together for fashion, this year’s theme for the presentation was “Harmony and Peace Through Fashion.”

Designers included: Chloe Trujillo from Los Angeles, Calif., Cristina Ruales from Brooklyn, N.Y., Fabrizzio Berrocal from Costa Rica, GM by Gustavo Moscoso from Ecuador, Kaleidoscopic by María de Lourdes Ramírez and Isabel Navarro Landa from Mexico, LENERD by Felipe Santamaría Luque from Colombia, Matías Hernán from Chile, Ossira by Agostina Orlandi and Ludmila Osikovsky from Argentina, Pionier by Janet Ríos and Carmen Artica from Peru, Santika by Danny Santiago from Miami, Fla., Tigresse by Fabio Yukio from Brazil

Digital dye-sublimation and direct-to-garment technologies, a relatively new trend in the textile industry, allow designers to alter textile designs, make color selections with the click of a mouse, and hone in on the fine details of their creations. Epson’s SureColor® F-Series printers give fashion and textile designers alike an accessible means to bring their ideas and inspiration to life, with the signature quality that distinguishes the Epson brand. The SureColor F-Series printers are high-speed, low-cost solutions that produce sharp, vivid images and offer an abundance of rich colors, intense blacks, and smooth gradations onto fabric.

Following Guests were in attendance: Abby Elliott, Arden Wohl, Barbie Ferreira, Chloe Norgaard, Harley Viera-Newton, Langley Fox, Selita Ebanks with music by Chelsea Leyland and Pamela Katz.

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